JPS58172A - 半導体集積回路装置の製造方法 - Google Patents

半導体集積回路装置の製造方法

Info

Publication number
JPS58172A
JPS58172A JP56097422A JP9742281A JPS58172A JP S58172 A JPS58172 A JP S58172A JP 56097422 A JP56097422 A JP 56097422A JP 9742281 A JP9742281 A JP 9742281A JP S58172 A JPS58172 A JP S58172A
Authority
JP
Japan
Prior art keywords
region
layer
polycrystalline silicon
silicon layer
oxide film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56097422A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0128507B2 (en]
Inventor
Akira Kawakatsu
川勝 章
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP56097422A priority Critical patent/JPS58172A/ja
Publication of JPS58172A publication Critical patent/JPS58172A/ja
Publication of JPH0128507B2 publication Critical patent/JPH0128507B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D48/00Individual devices not covered by groups H10D1/00 - H10D44/00
    • H10D48/30Devices controlled by electric currents or voltages
    • H10D48/32Devices controlled by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H10D48/34Bipolar devices
    • H10D48/345Bipolar transistors having ohmic electrodes on emitter-like, base-like, and collector-like regions

Landscapes

  • Bipolar Transistors (AREA)
  • Bipolar Integrated Circuits (AREA)
JP56097422A 1981-06-25 1981-06-25 半導体集積回路装置の製造方法 Granted JPS58172A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56097422A JPS58172A (ja) 1981-06-25 1981-06-25 半導体集積回路装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56097422A JPS58172A (ja) 1981-06-25 1981-06-25 半導体集積回路装置の製造方法

Publications (2)

Publication Number Publication Date
JPS58172A true JPS58172A (ja) 1983-01-05
JPH0128507B2 JPH0128507B2 (en]) 1989-06-02

Family

ID=14191990

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56097422A Granted JPS58172A (ja) 1981-06-25 1981-06-25 半導体集積回路装置の製造方法

Country Status (1)

Country Link
JP (1) JPS58172A (en])

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6297127A (ja) * 1985-10-24 1987-05-06 Tdk Corp 磁気記録媒体及びその製造方法
JPS6336567A (ja) * 1986-07-30 1988-02-17 Mitsubishi Electric Corp 半導体装置及びその製造方法
JPS6341074A (ja) * 1986-08-06 1988-02-22 Mitsubishi Electric Corp 半導体集積回路装置およびその製造方法
JPS63107167A (ja) * 1986-10-24 1988-05-12 Oki Electric Ind Co Ltd 半導体集積回路装置の製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5427774A (en) * 1977-08-03 1979-03-02 Nec Corp Semiconductor device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5427774A (en) * 1977-08-03 1979-03-02 Nec Corp Semiconductor device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6297127A (ja) * 1985-10-24 1987-05-06 Tdk Corp 磁気記録媒体及びその製造方法
JPS6336567A (ja) * 1986-07-30 1988-02-17 Mitsubishi Electric Corp 半導体装置及びその製造方法
JPS6341074A (ja) * 1986-08-06 1988-02-22 Mitsubishi Electric Corp 半導体集積回路装置およびその製造方法
JPS63107167A (ja) * 1986-10-24 1988-05-12 Oki Electric Ind Co Ltd 半導体集積回路装置の製造方法

Also Published As

Publication number Publication date
JPH0128507B2 (en]) 1989-06-02

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